Analysis Equipment

Focused Ion Beam System Specification

• Voltage

500 V to 30 kV

• Beam Current

0.1 pA~65 nA( 15steps aperture strip )

SEM Electron Optics Specification

• Resolution

0.6 nm at 15 kV to 2 kV, 0.7 nm at 1 kV

• Magnification

x 30 ~ x 1,280,000

•  Electron gun: Cold FEG

• Accelerating Voltage
  30, 80, 200 kV

• Resolution
  TEM Point : 0.23 nm
  TEM Lattice : 0.10 nm
  STEM Point : 0.078 nm(BF, DF)

• Magnification
  TEM: x2k ~ x2,000k
  STEM: x20k ~ x150,000k

• Cs-STEM
  (HAADF, LAADF, ABF, BF)

• Dual SDD(200mm2)

• EDS system

• 3D Tomography

• Oneview CMOS camera

• Acceleration voltage
  80, 200, 300 kV

• HAADF-STEM resolution
  300 kV, 0.05 nm

• EDS system
  Super-X, 4-SDD, 120mm^2